China-US team’s feat could ‘open entirely new avenues’ in semiconductors

A joint Chinese-US research team says it has developed a new semiconductor manufacturing method that it says could “open up entirely new avenues” to develop high-performance light-emitting and integrated devices. The process would surpass conventional lithography machines, which are the main way today of making the semiconductors used in most electronics. When a lithography machine etches a chip circuit, the laser strikes the material vertically. If light goes sideways, it causes uncontrolled...